CVD vacuum chemical vapor deposition equipment details
CVD equipment is suitable for hot wire chemical vapor deposition of diamond. Tungsten wire/tantalum wire is used as heater to heat and decompose carbon, activate chemical gas phase reaction and prepare diamond film.
Installation form | vertical |
Heater distribution mode | Distribution of circumference |
Heater material | Tungsten/tantalum wire |
Thermal insulation material | — |
Maximum temperature | 3000℃ |
Temperature control precision | ±1℃ |
Temperature homogeneity | ±5℃ |
Limit vacuum degree | 5×10-4Pa |
Size of average temperature zone | Customized according to customer requirements |
Mode of control | Automatic/Manual |
Tel:024-78992751
Fax:024-78992761
Address of factory:East Tieling County, Tieling City, Liaoning Province Nw Intersection of 1st Street and Xidi Road (New High Line)