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CVD vacuum chemical vapor deposition equipment

CVD vacuum chemical vapor deposition equipment

  • Category:Carbide vacuum equipment
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  • Release time:2022-10-17 08:50:44
  • Product description

CVD vacuum chemical vapor deposition equipment


CVD vacuum chemical vapor deposition equipment details

CVD equipment is suitable for hot wire chemical vapor deposition of diamond. Tungsten wire/tantalum wire is used as heater to heat and decompose carbon, activate chemical gas phase reaction and prepare diamond film.


Installation form

vertical

Heater distribution mode

Distribution of circumference

Heater material

Tungsten/tantalum wire

Thermal insulation material

Maximum temperature

3000℃

Temperature control precision

±1℃

Temperature homogeneity

±5℃

Limit vacuum degree

5×10-4Pa

Size of average temperature zone

Customized according to customer requirements

Mode of control

Automatic/Manual


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Shenyang Weitai Technology Development Co., Ltd

Tel:024-78992751

Fax:024-78992761 

Address of factory:East Tieling County, Tieling City, Liaoning Province Nw Intersection of 1st Street and Xidi Road (New High Line)


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